SAATILENE HI-R
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USE:
Saatilene Hi-R is a high-tension and low stretching monofilament polyester screen printing fabric with patented surface treatment ideal for all traditional applications.
The atmospheric plasma process is a highly innovative plasma technology in the fabric surface treatment sector. It is based on a dielectric-barrier discharge (DBD) thanks to which an electric discharge between two electrodes ionises the air surrounding the electrodes.
This type of process modifies the fabric surface at a nanoscale. The surface modification treatment is applied on all types of fabrics, even very large ones (up to 4 metres).
DESCRIPTION AND FEATURES:
Ready to use: the preliminary degreasing treatment can be eliminated.
Ideal adherence of stencil with ensuing minor breakage on the press and much longer stretches than other conventional fabrics treated.
Better resolution of fine details.
Better wetting capability and excellent stencil surface.
Safe exposure to all types of emulsions, fotopolimeric, double polymerisation, diazo and capillary films.
Production of finer detail without ruining durability of stencil (half-coloured, fine sections, etc.).
Excellent for use with abrasive printing conditions, pastes and inks.
Good mechanical behaviour.
Easy to use.
Helps reducing ghost imaging.
Good antistatic properties.
Saatilene Hi-R is a high-tension and low stretching monofilament polyester screen printing fabric with patented surface treatment ideal for all traditional applications.
The atmospheric plasma process is a highly innovative plasma technology in the fabric surface treatment sector. It is based on a dielectric-barrier discharge (DBD) thanks to which an electric discharge between two electrodes ionises the air surrounding the electrodes.
This type of process modifies the fabric surface at a nanoscale. The surface modification treatment is applied on all types of fabrics, even very large ones (up to 4 metres).
DESCRIPTION AND FEATURES:
Ready to use: the preliminary degreasing treatment can be eliminated.Ideal adherence of stencil with ensuing minor breakage on the press and much longer stretches than other conventional fabrics treated. Better resolution of fine details.Better wetting capability and excellent stencil surface.Safe exposure to all types of emulsions, fotopolimeric, double polymerisation, diazo and capillary films.Production of finer detail without ruining durability of stencil (half-coloured, fine sections, etc.).Excellent for use with abrasive printing conditions, pastes and inks.Good mechanical behaviour.Easy to use.Helps reducing ghost imaging.Good antistatic properties.
